Feature/Function:

* Dual-use sputtering and evaporation function, less occupied area, competitive price, stable performance and low maintenance costs;

* Can be used for the preparation of single and multi-layer metal film, dielectric film, semiconductor film, magnetic film, sensor film, heat-resistant alloy film, hard film, corrosion-resistant film, etc.;

* Coating samples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silica, etc .;

 * Single target sputtering, multi-target sputtering in turns, multi-target sputtering simultaneously and so on functions.

Application: Colleges & universities, research institutes and enterprises develop new thin film materials and samll batch production.

Technical Parameters